Photolithography without a mask: Multilayer lithography with the Maskless Aligner MLA 150

The Maskless Aligner MLA 150 takes you into the future of photolithography: You no longer need a photomask to create a pattern, instead simply expose your design directly onto your coated wafer. Any change in your pattern can be easily accommodated: In contrast to the use of a Mask Aligner, in this case there is no need to fabricate or order a new mask. You simply adapt your CAD file. This technology makes the Maskless Aligner a lithography tool which is not just inherently flexible, but also easy to operate, economical and fast. The applications areas of the Maskless Aligner are manifold: MEMS, micro-optics, sensors, electronic components and much more. With a minimum feature size of one micron (in standard mode!) this direct write lithography tool finds use in Research and Development, fast prototyping, or low-level production. Our movie takes you through a typical exposure process: setup, substrate loading, alignment, and the exposure itself. It demonstrates impressively the amazingly fast and straightforward operation of the Maskless Aligner MLA 150. The system assists you every step of the way: The alignment procedure in particular turns out to be outstandingly easy to perform. Find out more about the MLA 150 Maskless Aligner: https://heidelberg-instruments.com/pr...