UIUC MRL March RIE traning video

March CS-1701 reactive ion etcher is a bench-top system with water cooled RF platen. It is capable of etching photoresist, polymer and graphene. This system could be operated under manual mode or auto mode. Features: 400W, 13.56 MHz RF Generator with Automatic Matching Network Delivers Excellent Process Repeatability. Two MFC gas flow channels: O2 and CF4. The March RIE 1/2 chamber is configured with a 7”/5” powered electrode to accommodate a wide range of wafer sizes.