CMOS -P Well Continution | VLSI DESIGN | SNS Institutions

The P-well process for CMOS fabrication creates P-type wells on an N-type silicon substrate. It accommodates NMOS transistors inside the P-well and PMOS transistors directly on the N-substrate, using masking, ion implantation, and etching steps to integrate both devices on a single chip. #snsinstitutions #snsdesignthinkers #designthinking